Chemical vapor deposition system (CVD)

The function:

The function of the chemical vapor deposition system is to deposit thin films on the substrate, improve the material properties, manufacture functional devices, achieve surface modification, precisely control the thickness of the thin films, improve the product quality, assist in the research and development of new materials, and be used in integrated circuit manufacturing, etc., with the advantages of high process controllability, capable of large-scale production, and possibly lower cost.